This up-to-date handbook covers the main topics of preparation, characterization and properties of complex metal-based layer systems. The authors, an outstanding group of researchers, discuss advanced methods for structure, chemical and electronic state characterization with reference to the properties of thin functional layers, such as metallization and barrier layers for microelectronics, magneto resistive layers for GMR and TMR, sensor and resistance layers. As such, the book addresses materials specialists in industry, especially in microelectronics, as well as scientists, and can also be recommended for advanced studies in materials science, analytics, surface and solid state science.

Klaus Wetzig studied physics at the University of Technology in Dresden, receiving his licence in 1963, his doctorate in 1967 and his habilitation in 1973. In 1975, he moved to the Academy of Sciences, and since 1992, he is Professor of Materials Analysis at the University of Technology in Dresden and Director at the Leibniz Institute for Solid State and Materials Research Dresden. His research interests include materials analysis and microstructures, especially electron microscopy of functional materials, characterization of thin films for electronics, and nanostructural features in general.

Claus Michael Schneider studied physics at the Institute of Technology Aachen receiving his diploma in 1985. He obtained his phD in 1990, at the Free University of Berlin and his habilitation in 1996 at Martin-Luther-University, Halle. In 1998, he moved to the Leibniz-Institute of Solid State and Materials Research Dresden, heading the department of thin film systems and nanostructures.

His research interests include solid state physics, thin film systems and surface magnetism as well as the physics of nanostructures.

Nie ma jeszcze żadnych recenzji.

Preface.

List of Contributors.

1 Introduction (Klaus Wetzig, Claus M. Schneider).

1.1 Prologue.

1.2 Organization, Aim and Content of This Book.

2 Thin Film Systems: Basic Aspects.

2.1 Interconnects for Microelectronics (Ralph Spolenak, Ehrenfried Zschech).

2.1.1 Introduction.

2.1.2 Metallization Layers.

2.1.3 Materials Science of Metallic Interconnects.

2.1.4 Function of Barrier and Nucleation Layers and Materials Selection.

2.2 Metallization Structures in Acoustoelectronics (Manfred Weihnacht).

2.2.1 Introduction.

2.2.2 Fundamentals of Surface Acoustic Waves.

2.2.3 Interdigital Transducers (IDTs).

2.2.4 Reflector Gratings.

2.2.5 Waveguides, Energy Trapping.

2.2.6 Multistrip Couplers.

2.2.7 Interdigital Transducers with Piezoelectric Layer.

2.2.8 Metal Strips with Dielectric Coatings.

2.3 Silicide Layers for Electronics (Joachim Schumann).

2.3.1 Introduction.

2.3.2 The Basic Chemical and Physical Properties.

2.3.3 Preparation of Silicides.

2.3.4 Silicides with Metallic Conductivity.

2.3.5 Semiconducting Silicides.

2.3.6 Heterogeneously Disordered Silicide Films.

2.4 Complex Layered Systems for Magnetoelectronics (Claus M. Schneider).

2.4.1 Introduction.

2.4.2 Magnetism: A Primer.

2.4.3 Magnetic Coupling Phenomena.

2.4.4 Electric Transport in Layered Magnetic Systems.

2.4.5 Functional Thin Film Systems.

2.5 Multilayer and Single-Surface Reflectors for X-Ray Optics (Hermann Mai, Stefan Braun).

2.5.1 Introduction.

2.5.2 Refraction and Reflection at Single Boundaries.

2.5.3 Bragg Reflection at 1D Lattice Systems.

2.5.4 Multilayer Preparation.

2.6 Metallic Layers for Photovoltaics (Winfried Blau).

2.6.1 Introduction.

2.6.2 Solar Cells.

2.6.3 Functionalities of Thin Metallic Films in PV Cells.

2.6.4 Examples.

2.7 References.

3 Thin Film Preparation and Characterization Techniques.

3.1 Thin Film Preparation Methods (Christian Wenzel).

3.1.1 Introduction.

3.1.2 Physical Vapor Deposition.

3.1.3 Chemical Vapor Deposition.

3.1.4 Non Vacuum-Based Deposition.

3.1.5 Outlook.

3.2 Electron Microscopy and Diffraction (Klaus Wetzig, Jürgen Thomas).

3.2.1 Transmission Electron Microscopy (TEM)-Imaging.

3.2.2 TEM-Selected Area Electron Diffraction.

3.2.3 In situ-SEM Methods.

3.2.4 Electron Backscatter Diffraction.

3.3 X-Ray Scattering Techniques (Michael Hecker).

3.3.1 Wide Angle Diffraction.

3.3.2 Reflectometry.

3.3.3 Soft X-Rays and Magnetic Scattering.

3.4 Spectroscopic Techniques (Klaus Wetzig).

3.4.1 Element Distribution Analysis.

3.4.2 Element Depth Profile Analysis.

3.5 Stress Measurement Techniques (Winfried Brückner).

3.5.1 Stress and Strain.

3.5.2 Substrate Curvature.

3.5.3 Measurement Techniques.

3.6 References.

4 Challenges for Thin Film Systems Characterization and Optimization.

4.1 Electromigration in Metallization Layers (Ralph Spolenak, Horst Wendrdock, Klaus Wetzig).

4.1.1 Fundamentals.

4.1.2 Methods for Quantitative Damage Analysis.

4.1.3 Al Interconnects.

4.1.4 Cu Interconnects.

4.2 Barrier and Nucleation Layers for Interconnects (Ehrenfried Zschech).

4.2.1 Introduction.

4.2.2 PVD Barrier Layers for Copper Interconnects.

4.2.3 Barrier/Seed Microstructure and Step Coverage.

4.2.4 New Barrier/Seed Concepts Using CVD and ALD.

4.2.5 Atomic Layer Deposition (ALD).

4.3 Acoustomigration in Surface Acoustic Waves Structures (Siegfried Menzel, Klaus Wetzig).

4.3.1 General Remarks.

4.3.2 Acoustomigration Mechanism.

4.3.3 Metallization Concepts for Power SAW Structures.

4.3.4 Experimental Setup and SAW Technology.

4.3.5 Acoustomigration Experiments.

4.4 Thermal Stability of Magnetoresistive Layer Stacks (Claus M. Schneider, Jürgen Thomas).

4.4.1 Metallic Multilayers as GMR Model Systems.

4.4.2 Co/Cu Multilayers.

4.4.3 Ni80Fe20/Cu Multilayers.

4.5 Functional Magnetic Layers for Sensors and MRAMs (Hartmut Vinzelberg, Dieter Elefant).

4.5.1 Magnetic Multilayers: Layer Thickness Dependence of the GMR Parameters.

4.5.2 Spin Valves.

4.5.3 Magnetic Tunnel Junctions.

4.6 Multilayers for X-Ray Optical Purposes (Hermann Mai, Stefan Braun).

4.6.1 Multilayers as Reflectors for X-Rays.

4.6.2 Real Structure of nm-Multilayers.

4.6.3 High-Resolution Multilayers.

4.6.4 Multilayers with Uniform and Graded Period Thickness.

4.7 Functional Electric Layers (Joachim Schumann, Jürgen Thomas).

4.7.1 Resistance Layers.

4.7.2 Thermoelectric Thin Films.

4.8 References.

5 Devices.

5.1 Device Related Aspects for Si-Based Electronics (Ehrenfried Zschech).

5.1.1 Interconnect Technology and Materials Trends for Memory and Logic Products,

5.1.2 Copper Inlaid Process: Process Integration and Materials Related Topics.

5.1.3 Wiring Hierarchy for Copper/Low-k on-Chip Interconnects.

5.1.4 New Global Interconnect Concepts.

5.2 SAW High Frequency Filters, Resonators and Delay Lines (Manfred Weihnacht).

5.2.1 Introduction.

5.2.2 Transversal Filters.

5.2.3 Resonators.

5.2.4 Filters with Spread Spectrum.

5.2.5 Delay Lines.

5.3 Sensor Devices (Christoph Treutler).

5.3.1 Introduction.

5.3.2 Requirements for Thin Films to be Used as Transducers.

5.3.3 Thin Film Strain Gauges for Pressure Sensors and Force Meters.

5.3.4 Thin Film Thermometer in a Micromachined Air-Mass Flow Meter for Automotive Applications.

5.3.5 Magnetic Thin Films for Measuring Position, Angle, Rotational Speed and Torque.

5.4 X-Ray Optical Systems (Hermann Mai, Stefan Braun).

5.4.1 Basic Properties of the Combination of X-Ray Optical Elements.

5.4.2 X-Ray Astronomy.

5.4.3 X-Ray Microscopy.

5.4.4 Extreme Ultraviolet Lithography (EUVL).

5.4.5 X-Ray Reflectometry and Diffractometry.

5.4.6 X-ray Fluorescence Analysis.

5.5 Thermoelectric Sensors and Transducers (Joachim Schumann).

5.5.1 Introduction.

5.5.2 Thermoelectric Energy Conversion – Some Basic Considerations.

5.5.3 Thermoelectric Sensors.

5.5.4 Thermoelectric Transducers.

5.5.5 Outlook.

5.6 References.

6 Outlook (Klaus Wetzig, Claus M. Schneider).

6.1 New Functionalities.

6.2 Materials-Related Aspects.

6.3 Microelectronics – Quo Vadis?

6.4 What You See is What You Get.

6.5 References.

Index.